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Artigo de periodico
Synchrotron radiation applied to real-time studies of the kinetics of growth of aluminum nitride thin multilayers (2019)
García Molleja, J ; Burgi, Juan; Kellermann, G; Craievich, Aldo Felix ; Neuenschwander, R; Jouan, P Y; Djouadi, M A; Piccoli, M; Bemporad, E; Felicis, D de; Feugeas J N
Source: Journal of Physical Chemistry B. Unidade: IF
Subjects: DIFRAÇÃO POR RAIOS X, RADIAÇÃO SINCROTRON
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ABNT
GARCÍA MOLLEJA, J et al. Synchrotron radiation applied to real-time studies of the kinetics of growth of aluminum nitride thin multilayers. Journal of Physical Chemistry B, v. 123, n. 7, p. 1679−1687, 2019Tradução . . Disponível em: https://doi.org/10.1021/acs.jpcb.8b09496. Acesso em: 27 abr. 2024.
APA
García Molleja, J., Burgi, J., Kellermann, G., Craievich, A. F., Neuenschwander, R., Jouan, P. Y., et al. (2019). Synchrotron radiation applied to real-time studies of the kinetics of growth of aluminum nitride thin multilayers. Journal of Physical Chemistry B, 123( 7), 1679−1687. doi:10.1021/acs.jpcb.8b09496
NLM
García Molleja J, Burgi J, Kellermann G, Craievich AF, Neuenschwander R, Jouan PY, Djouadi MA, Piccoli M, Bemporad E, Felicis D de, Feugeas J N. Synchrotron radiation applied to real-time studies of the kinetics of growth of aluminum nitride thin multilayers [Internet]. Journal of Physical Chemistry B. 2019 ; 123( 7): 1679−1687.[citado 2024 abr. 27 ] Available from: https://doi.org/10.1021/acs.jpcb.8b09496
Vancouver
García Molleja J, Burgi J, Kellermann G, Craievich AF, Neuenschwander R, Jouan PY, Djouadi MA, Piccoli M, Bemporad E, Felicis D de, Feugeas J N. Synchrotron radiation applied to real-time studies of the kinetics of growth of aluminum nitride thin multilayers [Internet]. Journal of Physical Chemistry B. 2019 ; 123( 7): 1679−1687.[citado 2024 abr. 27 ] Available from: https://doi.org/10.1021/acs.jpcb.8b09496
Artigo de periodico
Synchrotron radiation applied to real-time studies of the kinetics of growth of aluminum nitride thin multilayers (2019)
Molleja, J García; Burgi, J; Kellermann, G; Craievich, Aldo Felix; Neuenschwander, R; Jouan, P Y; Djouadi, M A; Piccoli, M; Bemporad, E; Felicis, D de; Feugeas J N
Source: Journal of Physical Chemistry B. Unidade: IF
Assunto: FILMES FINOS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
MOLLEJA, J García et al. Synchrotron radiation applied to real-time studies of the kinetics of growth of aluminum nitride thin multilayers. Journal of Physical Chemistry B, v. 123, p. 1679−1687, 2019Tradução . . Disponível em: https://doi.org/10.1021/acs.jpcb.8b09496. Acesso em: 27 abr. 2024.
APA
Molleja, J. G., Burgi, J., Kellermann, G., Craievich, A. F., Neuenschwander, R., Jouan, P. Y., et al. (2019). Synchrotron radiation applied to real-time studies of the kinetics of growth of aluminum nitride thin multilayers. Journal of Physical Chemistry B, 123, 1679−1687. doi:10.1021/acs.jpcb.8b09496
NLM
Molleja JG, Burgi J, Kellermann G, Craievich AF, Neuenschwander R, Jouan PY, Djouadi MA, Piccoli M, Bemporad E, Felicis D de, Feugeas J N. Synchrotron radiation applied to real-time studies of the kinetics of growth of aluminum nitride thin multilayers [Internet]. Journal of Physical Chemistry B. 2019 ; 123 1679−1687.[citado 2024 abr. 27 ] Available from: https://doi.org/10.1021/acs.jpcb.8b09496
Vancouver
Molleja JG, Burgi J, Kellermann G, Craievich AF, Neuenschwander R, Jouan PY, Djouadi MA, Piccoli M, Bemporad E, Felicis D de, Feugeas J N. Synchrotron radiation applied to real-time studies of the kinetics of growth of aluminum nitride thin multilayers [Internet]. Journal of Physical Chemistry B. 2019 ; 123 1679−1687.[citado 2024 abr. 27 ] Available from: https://doi.org/10.1021/acs.jpcb.8b09496
Trabalho de evento
Reactive sputter magnetron reactor for preparation of thin films and simultaneous in-situ structural study by X-ray diffraction (2013)
Feugeas J N; Bürgi, J; J Garcia MollejaA. F. Craievich3 , Kellermann, G.4 , and Neueschwander, R.5; Craievich, Aldo Felix; Kellermann, G; Neueschwander, R
Conference titles: Reunião Anual de Usuários do LNLS/CNPEM. Unidade: IF
Subjects: FILMES FINOS, DIFRAÇÃO POR RAIOS X
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
FEUGEAS J N, et al. Reactive sputter magnetron reactor for preparation of thin films and simultaneous in-situ structural study by X-ray diffraction. 2013, Anais.. Campinas: Instituto de Física, Universidade de São Paulo, 2013. Disponível em: http://lnls.cnpem.br/rau/files/2013/04/Livro-Resumos-23RAU.pdf. Acesso em: 27 abr. 2024.
APA
Feugeas J N,, Bürgi, J., J Garcia MollejaA. F. Craievich3 , K., Craievich, A. F., Kellermann, G., & Neueschwander, R. (2013). Reactive sputter magnetron reactor for preparation of thin films and simultaneous in-situ structural study by X-ray diffraction. In . Campinas: Instituto de Física, Universidade de São Paulo. Recuperado de http://lnls.cnpem.br/rau/files/2013/04/Livro-Resumos-23RAU.pdf
NLM
Feugeas J N, Bürgi J, J Garcia MollejaA. F. Craievich3 K, Craievich AF, Kellermann G, Neueschwander R. Reactive sputter magnetron reactor for preparation of thin films and simultaneous in-situ structural study by X-ray diffraction [Internet]. 2013 ;[citado 2024 abr. 27 ] Available from: http://lnls.cnpem.br/rau/files/2013/04/Livro-Resumos-23RAU.pdf
Vancouver
Feugeas J N, Bürgi J, J Garcia MollejaA. F. Craievich3 K, Craievich AF, Kellermann G, Neueschwander R. Reactive sputter magnetron reactor for preparation of thin films and simultaneous in-situ structural study by X-ray diffraction [Internet]. 2013 ;[citado 2024 abr. 27 ] Available from: http://lnls.cnpem.br/rau/files/2013/04/Livro-Resumos-23RAU.pdf

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